▲ 260 ▼ China Has Reportedly Built Its First EUV Machine Prototype, Marking a Semiconductor Breakthrough the U.S. Has Feared All Along (wccftech.com) submitted 10 months ago by just_another_person@lemmy.world to c/technology@lemmy.world 79 comments fedilink hide all child comments
[–] dubyakay@lemmy.ca 2 points 10 months ago (2 children) Insanely good or Insanely stupid? permalink fedilink source parent hideshow 2 child comments replies: [–] eleijeep@piefed.social 2 points 10 months ago (1 child) It has its pros and cons. Pros are that it's faster and uses less energy and no complex optics system. Cons are that they have to replace the masks fairly regularly because they degrade with each imprint made. This probably also means that yields are lower towards the end of the life of the mask. permalink fedilink source parent hideshow 1 child comment replies: [–] SaveTheTuaHawk@lemmy.ca 1 point 10 months ago Huge QC fail rates. Will not scale well. permalink fedilink source parent
[–] eleijeep@piefed.social 2 points 10 months ago (1 child) It has its pros and cons. Pros are that it's faster and uses less energy and no complex optics system. Cons are that they have to replace the masks fairly regularly because they degrade with each imprint made. This probably also means that yields are lower towards the end of the life of the mask. permalink fedilink source parent hideshow 1 child comment replies: [–] SaveTheTuaHawk@lemmy.ca 1 point 10 months ago Huge QC fail rates. Will not scale well. permalink fedilink source parent
[–] SaveTheTuaHawk@lemmy.ca 1 point 10 months ago Huge QC fail rates. Will not scale well. permalink fedilink source parent